Surface Profiling

Example of GD-OES depth profiling of a coated metal sample (At% vs depth).

Many of today’s products engineered  in the automotive, aerospace, marine, construction andsemiconductor industry depend upon the precise control of  microstructural and compositional properties on the surface or subsurface to achieve unique properties including corrosion resistance, performance enhancement, and extended lifetime.  A few examples of the applications or products that  benefit from the GD-OES instrumentation available at EMSL Analytical are: hard disks, PZT layers, deposition layers to achieve optical properties, case hardening and thin oxides on alloys, and many more.  

The GD-OES system at EMSL utilizes pulse matched RF source, the only technique that can provide both surface, depth profile and bulk elemental composition with high sensitivity for all elements (including the light elements) applicable to almost all solid materials, including metals, metal alloy coatings, semiconductors, polymer coatings, and glass.


Subsection of specific test results or designed targets:

Bulk elemental composition (no click)

Surface Science/Thin Films


Surface Science/Thin films click-on:

Depth profile analysis is a continuous process of sputtering through a sample at a rate of typically 3 microns per minute. The results are usually presented as concentration of elements versus depth; hence the analysis offers both the elemental composition and the thickness of subsequent layers. The GD-OES profiler at EMSL Analytical provides the ability to measure elements at both trace and major concentrations instantaneously. The low energy of the incident particles of the instrument assures minimal surface damage and the speed of sputtering and signal collection allow depth profiles of both thin and thick films such as PVD/CVD thin films, semiconductors, coated steels, metals alloys, ceramics, and layers on glass. 


Products & Applications List:

Useful applications for GD-OES include Lithium Battery depth profiling of positive and negative electrodes, chemical composition measurements, etc.